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Search Results
| Name | Grades | Rating | |||
|---|---|---|---|---|---|
Not teaching in Spring 2026 | |||||
MECH 6341 (Overall) | |||||
A- | |||||
MECH 6341 Wenchuang Hu | |||||
A- | |||||
MECH 6341 Golden Kumar | |||||
B | |||||
MECH 6341 Manuel Quevedo-Lopez | |||||
A- | |||||
Search Results
| Name | Grades | Rating | |||
|---|---|---|---|---|---|
Not teaching in Spring 2026 | |||||
MECH 6341 (Overall) | |||||
A- | |||||
MECH 6341 Wenchuang Hu | |||||
A- | |||||
MECH 6341 Golden Kumar | |||||
B | |||||
MECH 6341 Manuel Quevedo-Lopez | |||||
A- | |||||
Lithography and Nanofabrication
MECH 6341
Erik Jonsson School of Engineering and Computer Science
Study of the principles, practical considerations, and instrumentation of major lithography technologies for nanofabrication of devices and materials. Advanced photolithography, electron beam lithography, nanoimprint lithography, x-ray lithography, ion beam lithography, soft lithography, and scanning probe lithography, basic resist and polymer science, applications in nanoelectronic and biomaterials. 3 credit hours.
Offering Frequency: Each year
Grades: 67
Median GPA: A-
Mean GPA: 3.409
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Lithography and Nanofabrication
MECH 6341
Erik Jonsson School of Engineering and Computer Science
Study of the principles, practical considerations, and instrumentation of major lithography technologies for nanofabrication of devices and materials. Advanced photolithography, electron beam lithography, nanoimprint lithography, x-ray lithography, ion beam lithography, soft lithography, and scanning probe lithography, basic resist and polymer science, applications in nanoelectronic and biomaterials. 3 credit hours.
Offering Frequency: Each year
Grades: 67
Median GPA: A-
Mean GPA: 3.409
Click a checkbox to add something to compare.