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Integrated Circuit Technology
EE 4330
Erik Jonsson School of Engineering and Computer Science
Principles of design and fabrication of integrated circuits. Bipolar and MOS technologies. Passive and active component performance, fabrication techniques including epitaxial growth, photolithography, oxidation, diffusion, ion-implantation, thin and thick film components. Design and layout of integrated devices. Relations between layout and fabrication technique. 3 credit hours.
Prerequisite: CE 3310 or EE 3310.
Offering Frequency: Each semester
Grades: 496
Median GPA: A-
Mean GPA: 3.408
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Integrated Circuit Technology
EE 4330
Erik Jonsson School of Engineering and Computer Science
Principles of design and fabrication of integrated circuits. Bipolar and MOS technologies. Passive and active component performance, fabrication techniques including epitaxial growth, photolithography, oxidation, diffusion, ion-implantation, thin and thick film components. Design and layout of integrated devices. Relations between layout and fabrication technique. 3 credit hours.
Prerequisite: CE 3310 or EE 3310.
Offering Frequency: Each semester
Grades: 496
Median GPA: A-
Mean GPA: 3.408
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